Pr. Mathieu SALAUN
Fonction : Professeur des Universités - Praticien Hospitalier
Groupe : Quantif
Publications
80 documents
- C. Prahoveanu, L. Laversenne, M. Salaun, C. De Vaulx, K. Azzouz, et al.. Effect of Sb‐doping on the thermoelectric properties of Mg2Si thin films synthesized by microwave plasma‐assisted co‐sputtering. 34th Annual International Conference on Thermoelectrics & 13th European Conference on Thermoelectrics (ICT & ECT 2015), Jun 2015, Dresden, Germany. ⟨in2p3-01176819⟩
- D. Borah, S. Rasappa, M. Salaün, M. Zelsmann, O. Lorret, et al.. Soft graphoepitaxy for large area directed self-assembly of polystyrene-block-poly(dimethylsiloxane) block copolymer on nanopatterned POSS substrates fabricated by nanoimprint lithography. Advanced Functional Materials, 2015, 25 (22), pp.3425-3432. ⟨10.1002/adfm.201500100⟩. ⟨hal-01869187⟩
- J. Garnier, S. Böhme, C. Girardot, M. Salaun, J. Arias-Zapatta, et al.. Polystyrene brush optimization for directed self-assembly of high-X PS-b-PDMS diblock copolymer. European Materials Research Society conference- E-MRS 2015, Spring, 2015, Lille, France. ⟨hal-01877848⟩
- C. Simao, W. Khunsin, N. Kehagias, M. Salaün, M. Zelsmann, et al.. Order quantification of hexagonal periodic arrays fabricated by in situ solvent-assisted nanoimprint lithography of block copolymers. Nanotechnology, 2014, 25 (17), pp.175703. ⟨10.1088/0957-4484/25/17/175703⟩. ⟨hal-01798223⟩
- Gottlieb Oehrlein, Qinghuang Lin, Ying Zhang, Sophie Archambault, Cécile Girardot, et al.. Directed self-assembly of PS-b-PDMS into 193nm photoresist patterns and transfer into silicon by plasma etching. SPIE Advanced Lithography, 2014, San Jose, United States. ⟨10.1117/12.2047287⟩. ⟨hal-01797999⟩
- C. Girardot, S. Böhme, S. Archambault, M. Salaün, E. Latu-Romain, et al.. Pulsed transfer etching of PS–PDMS block copolymers self-assembled in 193 nm lithography stacks. ACS Applied Materials & Interfaces, 2014, 18 (6), pp.16276-16282. ⟨10.1021/am504475q⟩. ⟨hal-01798236⟩
- S. Archambault, M. Salaün, C. Girardot, M. Delalande, G. Cunge, et al.. PS-b-PDMS graphoepitaxy in trilayer 193 nm photolithography patterns and transfer etching. Micro- and Nano-Engineering conference- MNE 2013, Sep 2013, Londres, United Kingdom. ⟨hal-00946840⟩
- O. Lorret, J. Kastner, M. Salaün, M. Zelsmann, B. Kosmala, et al.. Multi-functionalized Polyhedral Oligomeric Silsesquioxane (POSS): Promising Materials for surface chemistry. EuroNano Forum - ENF 2013, Jun 2013, Dublin, Ireland. ⟨hal-00946862⟩
- S. Archambault, M. Salaun, M. Delalande, G. Cunge, E. Pargon, et al.. PS-b-PDMS graphoepitaxy in trilayer 193 nm photolithography patterns and transfer etching. Directed self-assembly workshop at EuroNano Forum - ENF 2013, Jun 2013, Dublin, Ireland. ⟨hal-00860961⟩
- O. Lorret, J. Kastner, B. Dittert, M. Salaun, M. Zelsmann, et al.. Multi-functionalized polyhedral oligomeric silsesquioxane (POSS): promising materials for surface chemistry. Third International Conference on Multifunctional, Hybrid and Nanomaterials - Hybrid Materials 2013, Mar 2013, Sorrento, Italy. ⟨hal-00860948⟩
Documents récupérés de l'archive ouverte HAL 